PROCEDURE FOR TAKING MAKE-UP
IN TO THE SYSTEM |
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The
tank level is to be normally maintained at approximately 220 mm . ( 255 mm HI
alarm , 195 LO alarm ) .When ever the tank level drops to below 200 mm the PW
system makeup to be taken up to 240 mm . |
The
approved committee must be informed before taking PW make up in to the system
for any reason. |
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Always
the make-up should be taken through Ion exchanger circuit only . |
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At
a time, make-up quantity should not be more than 100 liters. However
depending on the requirement thisquantity will vary. |
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Steps
for taking Makeup : |
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Put
DM make-up line to PW system under flushing up to the inlet valve by opening
the drainvalve . |
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Isolate
the ion Exchange circuit from the main PW system by closing both inlet and
outlet valve.Ensure direct makeup is closed. |
Stop
alakaliser system & close the valve . |
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Stop
Flushing of DM water after 2 hours . |
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Open
the drain after fine filter in treatment circuit & open the Makeup
water valve to establish flow through the ion exchanger circuit |
Maintain
a flushing flow rate of 1m³/hr through drain valve till conductivity after
ion exchanger is 1µmho/cm . |
Then
get clearance from chemistry for taking makeup into system . Stop flushing by
closing the drain valve . |
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Note
down the Flow Integrator reading & SW tank level . |
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Take
make-up by opening the ion exchanger circuit outlet valve slowly. Monitor the
level in CCR as well as at local through the level gauge glass float & N2
pressure at 8.5 Mtr |
If
it is a normal running unit the quantity should not exceed 100 Litres at one
go . If it is a shut down unit(Winding remains bypassed ) it is to be taken
as per normal requirement i.e up to 300 mm in OH tank . |
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Precaution
During Taking Makeup :- |
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Ensure
that water does not get filled in the entire tank & enter in to purging
gas line during filling oraddition of make up water. |
After
taking make-up, close the make-up valve. Line-up the dosing system i.e., open
ion exchanger inlet valve fromPW pump discharge line. Adjust the flow in the
ion exchanger circuit to 40 LPM ( 2.4 m3 /Hr ) |
Start
Alaklyser circuit . |
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Nitrogen
purging to be started immediately as per the following procedure from H2
filling room till O2 < 20ppb . |
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PROCEDURE
FOR N2 PURGING AFTER SW MAKEUP |
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Preparatory
work |
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After
initial filling of the primary water circuit and following the addition of
larger quantities of primary water (>100dm3 ( 100 Liter ) per month), the
primary water tank should be purged with nitrogen to reduce the oxygen
contentof the primary water. |
During
purging, O2 is extracted from the primary water and discharged to the
atmosphere via the vent gas line. |
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Prerequisites
for N2 purging: |
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The
external primary water circuit was filled with water. |
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The
primary water pumps must be available |
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A
reliable nitrogen supply must be available. |
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The
N2 pressure reducer was set to a gauge pressure of 0.5 bar |
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